Japanese researchers mull using particle accelerator for chipmaking — researchers claim EUV-like lithography capabilities

There are a few slight problems with FELs and ERLs. First, like any particle accelerator, an energy recovery linear accelerator is huge. Second, one needs an extremely complex set of mirrors to guide that 10 kW of EUV radiation to multiple litho tools without significant loss of power, and that set has not been invented yet (and its costs are unclear).

It's an interesting concept, but it doesn't quite work yet, so no it does NOT have EUV like capabilities yet.

Implanting is basically this, if they could make photoresist sensitive to arsenic or phosphorus.